PhotoStress Analysis

PhotoStress® Analysis

The LF/Z-2 Computerised Reflection Polariscope System for Full-Field Stress Analysis.


What is PhotoStress® Analysis?
A full-field stress and strain analysis method
Can be utilised under various live load conditions
Suitable for residual stress analysis, assembly stress inspection, and fatigue tests
Can be applied to various materials (metals, composites, concrete, and more)
Easy to use and analyse results

Analysis of:
Stress resulting from fabrication tolerances
Stresses which occur during assembly processes
Residual stresses due to processes such as welding and casting
Simple or complex stress situations

The PhotoStress analysis system is composed of a reflection polariscope and PSCalc® computer software that enables the user to store and process LF/Z-2 readings of stress and strain. A variety of photoelastic coatings may be applied on a wide range of materials, with simple or complex shapes...Download brochure

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